The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2026

Filed:

Feb. 28, 2023
Applicant:

Fuji Electric Co., Ltd., Kawasaki, JP;

Inventor:

Keishirou Kumada, Matsumoto-city, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 62/10 (2025.01); H10D 12/01 (2025.01); H10D 30/66 (2025.01); H10D 62/17 (2025.01); H10D 62/832 (2025.01); H10P 30/22 (2026.01);
U.S. Cl.
CPC ...
H10D 62/109 (2025.01); H10D 12/031 (2025.01); H10D 30/668 (2025.01); H10D 62/393 (2025.01); H10D 62/8325 (2025.01); H10P 30/22 (2026.01);
Abstract

A silicon carbide semiconductor device has a silicon carbide semiconductor substrate of a first conductivity type1, a first semiconductor layer of the first conductivity type, a second semiconductor layer of a second conductivity type, first semiconductor regions of the first conductivity type, trenches, gate insulating films, gate electrodes, a first electrode, and a second electrode. The second semiconductor layer has a second semiconductor region of a second conductivity type, an impurity concentration of the second semiconductor region increases in the depth direction, has a maximum value at a predetermined depth, and from the predetermined depth, in the depth direction, decreases; a half-width of the impurity concentration is 0.15 μm or less; and an impurity concentration of the plurality of first semiconductor regions is constant in the depth direction.


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