The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2026
Filed:
Nov. 03, 2023
Applicants:
Korea Institute of Science and Technology, Seoul, KR;
Inha University Research and Business Foundation, Incheon, KR;
Inventors:
Assignees:
Korea Institute Of Science And Technology, Seoul, KR;
Inha University Research And Business Foundation, Incheon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/08 (2006.01); C23C 14/22 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/081 (2013.01); C23C 14/225 (2013.01); C23C 14/3414 (2013.01); C23C 14/35 (2013.01); H01J 37/3426 (2013.01);
Abstract
Provided is a method for manufacturing a multilayer structure. The method for manufacturing the multilayer structure includes providing a substrate in a chamber, providing a target in the chamber, and allowing a target material to be incident into the substrate so as to form a material layer. The target includes magnesium oxide or beryllium oxide. An incident angle of the target material to the substrate is about 9.14° or less.