The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2026

Filed:

Apr. 11, 2023
Applicant:

Disco Corporation, Tokyo, JP;

Inventor:

Ayumu Sakai, Tokyo, JP;

Assignee:

DISCO CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/04 (2006.01); B24B 1/00 (2006.01); B24B 37/04 (2012.01); C09G 1/00 (2006.01); H10P 52/40 (2026.01);
U.S. Cl.
CPC ...
C09G 1/04 (2013.01); B24B 1/00 (2013.01); B24B 37/044 (2013.01); C09G 1/00 (2013.01); H10P 52/402 (2026.01); H10P 52/403 (2026.01);
Abstract

A polishing liquid for polishing a compound semiconductor substrate includes an aqueous solution in which a permanganate and a water-soluble compound are dissolved. The water-soluble compound is obtained by combination of a strong acid and a transition metal element. The transition metal element includes at least one element of Group III elements, lanthanoid, or Group IV elements. Concentrations of ammonium ions and ammonia contained in the aqueous solution are equal to or less than concentrations of the Group III elements, the lanthanoid, and the Group IV elements.


Find Patent Forward Citations

Sakai, Ayumu. (2026). Polishing liquid for polishing compound semiconductor substrate (U.S. Patent No. 12692415). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12692415

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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