The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2026
Filed:
Aug. 13, 2020
Applicant:
Enkris Semiconductor, Inc., Suzhou, CN;
Inventors:
Kai Cheng, Suzhou, CN;
Peng Xiang, Suzhou, CN;
Assignee:
ENKRIS SEMICONDUCTOR, INC., Suzhou, CN;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 30/47 (2025.01); H10D 30/01 (2025.01); H10D 62/824 (2025.01); H10D 62/85 (2025.01);
U.S. Cl.
CPC ...
H10D 30/472 (2025.01); H10D 30/015 (2025.01); H10D 30/4732 (2025.01); H10D 62/824 (2025.01); H10D 62/8503 (2025.01);
Abstract
The present disclosure provides a semiconductor structure and a manufacturing method thereof. The semiconductor structure includes: a semiconductor substrate, a back barrier layer, a channel layer and an etch stop layer arranged from bottom to up; and a P-type semiconductor layer located on a source region and a drain region of the etch stop layer.