The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2026
Filed:
May. 02, 2023
Semes Co., Ltd., Cheonan-si, KR;
Sangjeong Lee, Hwaseong-si, KR;
Youngun Bong, Suwon-si, KR;
Yoonseok Choi, Suwon-si, KR;
Jaewon Shin, Suwon-si, KR;
Hanlim Kang, Seoul, KR;
Jongwon Park, Hwaseong-si, KR;
Hyunwoo Jo, Hwaseong-si, KR;
Kyunghun Jang, Jeonju-si, KR;
Semes Co., Ltd., Cheonan-si, KR;
Abstract
There is provided a substrate processing apparatus including a chamber having a processing space therein, a dielectric window arranged at an upper portion of the chamber and configured to cover an upper surface of the chamber, and an RF source disposed on the dielectric window and configured to supply RF power to generate plasma from gas in the processing space, wherein the RF source includes an RF electrode disposed on the dielectric window and an RF plate disposed on the RF electrode, the dielectric window includes a groove extending vertically downward from an uppermost surface of the dielectric window, and the RF plate has a ring shape.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile