The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2026
Filed:
May. 30, 2023
Intel Corporation, Santa Clara, CA (US);
Ibrahima Ndiour, Portland, OR (US);
Nilesh Ahuja, Cupertino, CA (US);
Ranganath Krishnan, Hillsboro, OR (US);
Mahesh Subedar, Portland, OR (US);
Omesh Tickoo, Portland, OR (US);
Ergin Genc, Portland, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Features extracted from one or more layers of a trained deep neural network (DNN) are used to detect out-of-distribution (OOD) data, such as anomalies. An OOD detection process includes transforming a feature output from a layer of the DNN from a relatively high-dimensional feature space to a lower-dimensional space, and then performing a reverse transformation back to the higher-dimensional feature space, resulting in a reconstructed feature. A feature reconstruction error is calculated based on a difference between the reconstructed feature and the original feature output from the DNN. The OOD detection process may further include calculating a score based on the feature reconstruction error and generating a visual representation of the feature reconstruction error.