The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2026

Filed:

Sep. 22, 2022
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Ofir Zafrir, Zichron Ya'akov, IL;

Guy Boudoukh, Ramat Hasharon, IL;

Ariel Lahrey, Haifa, IL;

Moshe Wasserblat, Maccabim, IL;

Haihao Shen, Shanghai, CN;

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06N 3/082 (2023.01); G06N 3/045 (2023.01);
U.S. Cl.
CPC ...
G06N 3/082 (2013.01); G06N 3/045 (2023.01);
Abstract

A student model may be trained in two stages by using two teacher models, respectively. The first teacher model has been trained with a pretraining dataset. The second teacher model has been trained with a training dataset that is specific to a task to be performed by the student model. In the first stage, the student model may be generated based on a structure of the first teacher model. Internal parameters of the student model are adjusted through a pretraining process based on the first teacher model and the pretraining dataset. Weights of the student model may be pruned during the pretraining process. In the second stage, a sparsity mask is generated for the student model to lock the sparsity pattern generated from the first stage. Further, some of the internal parameters of the student model are modified based on the second teacher model and the training dataset.


Find Patent Forward Citations

Loading…