The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2026

Filed:

Jan. 11, 2023
Applicant:

Nexperia B.v., Nijmegen, NL;

Inventor:

Steven Peake, Nijmegen, NL;

Assignee:

Nexperia B.V., Nijmegen, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 30/66 (2025.01); H10D 30/01 (2025.01); H10D 62/10 (2025.01); H10D 64/27 (2025.01);
U.S. Cl.
CPC ...
H10D 30/668 (2025.01); H10D 30/0297 (2025.01); H10D 62/127 (2025.01); H10D 64/513 (2025.01); H10D 64/516 (2025.01);
Abstract

A Metal Oxide Semiconductor (MOS), Field Effect Transistor (FET), (MOSFET) is provided, including a semiconductor body having a first major surface, and two trenches extending in the semiconductor body from the first major surface, a source region of a first conductivity type adjacent sidewalls of the two trenches at the first major surface, a drain region of the first conductivity type adjacent the two trenches at a position distant from the source region, a channel-accommodating region, of a second conductivity type opposite to the first conductivity type, adjacent the sidewalls of the two trenches between the source region and the drain region, and a first of the two trenches extends further into the semiconductor body compared to a second of the two trenches.


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