The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2026

Filed:

Sep. 01, 2021
Applicant:

Hitachi High-tech Analysis Corporation, Tokyo, JP;

Inventors:

Ayana Muraki, Tokyo, JP;

Tatsuya Asahata, Tokyo, JP;

Satoshi Tomimatsu, Tokyo, JP;

Makoto Sato, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/30 (2006.01); H01J 37/28 (2006.01); H01J 37/302 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3023 (2013.01); H01J 37/28 (2013.01);
Abstract

The present invention provides a computer, a program, and a charged particle beam processing system, with which it is possible to reduce adjustment and setting work of conditions for observation or machining by an operator in an FIB-SEM composite device. This computer comprises: an information acquisition unit that acquires information related to a recipe to be executed by a charged particle beam device provided with a charged particle irradiation optical system; and an information management unit that generates recipe management information based on the information acquired by the information acquisition unit and stores the recipe management information in a storage unit.


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