Distribution body for distributing a process gas for treating a substrate by means of the process gas

Abstract

The disclosure relates to a distribution body for distributing a process gas relative to a substrate to treat the substrate by means of the process gas, comprising a distribution plate, at least one gas inlet channel, a plurality of gas distribution channels, and a plurality of gas extraction channels, wherein the gas inlet channel extends from a lateral surface of the distribution plate to an interior of the distribution plate, wherein the gas distribution channels branch off from the at least one gas inlet channel and extend to a substrate-facing surface of the distribution plate to supply process gas to the substrate to be treated, wherein the gas distribution channels are directed essentially perpendicular to the substrate-facing surface, and wherein the gas extraction channels extend from the substrate-facing surface to a another surface of the distribution plate to convey gas away from the substrate. Further, the disclosure relates to a deposition system an a method for distributing a process gas relative to a substrate to treat the substrate by means of the process gas.