The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2026
Filed:
Jan. 17, 2025
Tripod Technology Corporation, Taoyuan City, TW;
Yu-Ming Chang, Taoyuan City, TW;
Yun-Shan Wang, Taoyuan City, TW;
Hsien-Yeh Chen, Taoyuan City, TW;
Paichun Chang, Taoyuan City, TW;
Tripod Technology Corporation, Taoyuan City, TW;
Abstract
A method for forming film includes the following steps: controlling a temperature of a workpiece in a chamber, so that a gaseous state sacrificial material desublimates into solid state on a surface of the workpiece to form a solid state sacrificial material layer; controlling a pressure in the chamber and the temperature of the workpiece, so that the solid state sacrificial material layer starts gradually sublimating into gaseous state; providing reactive polymer monomers into the chamber, so that the reactive polymer monomers start being deposited on the solid state sacrificial material layer through an adsorption process, and a polymerization reaction of the reactive polymer monomers is initiated, at the same time, the solid state sacrificial material layer continues gradually sublimating into gaseous state until completely sublimating into gaseous state, and the reactive polymer monomers form a polymer layer deposited on the surface of the workpiece.