The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2026

Filed:

Aug. 27, 2020
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Hajime Nakamura, Echizen, JP;

Koichi Hirota, Echizen, JP;

Tetsuya Ohashi, Fukui, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/06 (2006.01); B22F 1/05 (2022.01); C23C 14/34 (2006.01); C23C 14/50 (2006.01); H01F 1/057 (2006.01);
U.S. Cl.
CPC ...
B22F 1/05 (2022.01); C23C 14/067 (2013.01); C23C 14/3414 (2013.01); C23C 14/50 (2013.01); H01F 1/057 (2013.01);
Abstract

According to the present invention, a method for manufacturing a rare earth magnet that is capable of manufacturing a high-performance rare earth magnet with stable quality in large amount by the grain boundary diffusion method utilizing a film formed by the physical vapor phase deposition method is provided.


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