The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2026
Filed:
Jan. 30, 2023
Vat Holding Ag, Haag, CH;
VAT Holding AG, Haag, CH;
Abstract
A device () for homogenizing a gas distribution in a process chamber (). The device () has a aperture shield () and a linear drive () for moving the aperture shield () in a reciprocating manner in two mutually opposite linear movement directions () between two terminal positions. The aperture shield () is able to be heated by at least one heating installation () of the device (), and the aperture shield () by way of at least one interposed compensation element () of the device () is connected to the linear drive (). The compensation element () enables a relative movement between the aperture shield () and the linear drive () in at least one direction () transverse, preferably orthogonal, to the linear movement directions () of the aperture shield ().