The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2026

Filed:

Mar. 31, 2023
Applicant:

SK Hynix Inc., Gyeonggi-do, KR;

Inventors:

Heon Yong Chang, Gyeonggi-do, KR;

Hyeong Geun Joe, Gyeonggi-do, KR;

Assignee:

SK hynix Inc., Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10W 46/00 (2026.01); H10P 74/00 (2026.01); H10W 42/00 (2026.01); H10P 74/20 (2026.01); H10W 20/40 (2026.01);
U.S. Cl.
CPC ...
H10W 46/00 (2026.01); H10P 74/27 (2026.01); H10W 42/121 (2026.01); H10P 74/203 (2026.01); H10P 74/277 (2026.01); H10W 20/40 (2026.01); H10W 20/484 (2026.01); H10W 46/503 (2026.01);
Abstract

A semiconductor wafer according to an embodiment includes a monitoring pattern structure disposed over a substrate, a cover pattern layer covering portions of the monitoring pattern structure over the substrate, and contact patterns disposed over the cover pattern layer to extend over the cover pattern layer.


Find Patent Forward Citations

Chang, Heon. (2026). Semiconductor wafer including monitoring pattern structure with cover pattern layer and contact patterns disposed over monitoring pattern structure (U.S. Patent No. 12677674). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12677674

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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