The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2026

Filed:

Jul. 05, 2023
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Oscar Van Der Straten, Guilderland Center, NY (US);

Koichi Motoyama, Clifton Park, NY (US);

Chih-Chao Yang, Glenmont, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/528 (2006.01); H10W 20/00 (2026.01); H10W 20/41 (2026.01);
U.S. Cl.
CPC ...
H10W 20/435 (2026.01); H10W 20/056 (2026.01); H10W 20/082 (2026.01); H10W 20/425 (2026.01);
Abstract

A semiconductor device includes a metal line having a longitudinal axis. The metal line includes a first segment extending in a direction of the longitudinal axis and having a first cross-section, the first cross-section including a wider side and a narrower side. A second segment extends in a direction of the longitudinal axis and has a second cross-section, the second cross-section including a wider side and a narrower side. The narrower side of the second segment is formed in contact with the wider side of the first segment such that a portion of the wider side of the first segment extends beyond the narrow side of the second segment to form a terrace and the terrace and a tapered sidewall of the second segment form an acute angle.


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