The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2026

Filed:

Jun. 29, 2023
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Atsushi Sano, Toyama, JP;

Kenji Kameda, Toyama, JP;

Yushin Takasawa, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/30 (2006.01); C23C 16/36 (2006.01); C23C 16/455 (2006.01); H10P 14/60 (2026.01); H10P 14/692 (2026.01);
U.S. Cl.
CPC ...
H10P 14/6922 (2026.01); C23C 16/308 (2013.01); C23C 16/36 (2013.01); C23C 16/45527 (2013.01); C23C 16/45546 (2013.01); H10P 14/6339 (2026.01); H10P 14/6528 (2026.01); H10P 14/6529 (2026.01); H10P 14/662 (2026.01); H10P 14/6682 (2026.01); H10P 14/6686 (2026.01); H10P 14/6687 (2026.01);
Abstract

There is provided a technique which includes: forming a first film containing silicon, oxygen, carbon and nitrogen on a substrate by performing a first cycle a predetermined number of times, the first cycle including forming a first layer containing silicon, oxygen, carbon and nitrogen by supplying a first precursor containing silicon, nitrogen and carbon and an oxidant to the substrate, and performing a first modifying process to the first layer at a first temperature to desorb impurities contained in the first layer and densify the first layer; and performing, after forming the first film, a second modifying process to the first film at a second temperature that is not less than the first temperature to desorb impurities contained in the first film and densify the first film.


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