The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2026
Filed:
Jan. 06, 2024
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Erwin Slot, Zoetermeer, NL;
Mans Johan Bertil Osterberg, Rijswijk, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/14 (2006.01); H01J 37/141 (2006.01); H01J 37/28 (2006.01); H01J 37/145 (2006.01); H01J 37/147 (2006.01);
U.S. Cl.
CPC ...
H01J 37/141 (2013.01); H01J 37/28 (2013.01); H01J 37/145 (2013.01); H01J 37/1474 (2013.01);
Abstract
A charged particle apparatus, configured to project a charged particle multi-beam toward a sample, comprises: a charged particle source configured to emit a charged particle beam; a light source configured to emit light; and a charged particle-optical device configured to project toward the sample sub-beams of a charged particle multi-beam derived from the charged particle beam; wherein the light source is arranged such that the light is projected along paths of the sub-beams through the charged particle-optical device so as to irradiate at least a portion of the sample.