The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2026
Filed:
Dec. 15, 2022
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Daniel Rhinow, Frankfurt am Main, DE;
Bartholomaeus Szafranek, Ober-Ramstadt, DE;
Joachim Welte, Darmstadt, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/74 (2012.01); G03F 1/86 (2012.01); H01J 37/147 (2006.01); H01J 37/244 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
G03F 1/74 (2013.01); G03F 1/86 (2013.01); H01J 37/1471 (2013.01); H01J 37/244 (2013.01); H01J 37/317 (2013.01);
Abstract
Methods for repairing a defect of a lithographic mask with a particle beam are described. One such method can comprise the following steps: Processing the defect with the particle beam with a first set of processing parameters; processing the defect with the particle beam with a second set of processing parameters; wherein at least one parameter from the first set of processing parameters differs from the second set of processing parameters.