The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2026
Filed:
Sep. 17, 2021
Nilt Switzerland Gmbh, Horgen, CH;
Maksim Zalkovskij, Copenhagen, DK;
Jesper Fly Hansen, Copenhagen, DK;
Tobias Senn, Zurich, CH;
Brian Bilenberg, Ølstykke, DK;
NILT Switzerland GmbH, Horgen, CH;
Abstract
The present disclosure describes techniques that, in some instances, can help reduce stress and potential damage during the manufacture of optical elements such as those that include a metastructure formed by imprinting. In one aspect, a method of manufacturing an optical element includes imprinting a stamp into a polymeric material on a substrate, wherein the stamp includes first projections corresponding to an active area of the stamp for formation of meta-atoms in the polymeric material. The stamp further includes a protective structure laterally surrounding the first projections. The protective structure includes at least one additional projection extending in parallel to the first projections. The method includes removing the stamp from the polymeric material, thereby forming openings in the polymeric material in positions corresponding to the first projections and in one or more positions corresponding to the at least one additional projection.