The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2026
Filed:
Jan. 28, 2021
Tanaka Kikinzoku Kogyo K.k., Tokyo, JP;
Ryosuke Harada, Tsukuba, JP;
Tomohiro Tsugawa, Tsukuba, JP;
Shigeyuki Ootake, Tsukuba, JP;
Seung-Joon Lee, Tsukuba, JP;
Yohei Kotsugi, Tsukuba, JP;
TANAKA PRECIOUS METAL TECHNOLOGIES Co., Ltd., Tokyo, JP;
Abstract
The present invention relates to an organoruthenium compound raw material for a chemical deposition method. An organoruthenium compound is represented by the following Formula 1 in which a trimethylenemethane-based ligand (L), and two carbonyl ligands and a ligand X coordinate to divalent ruthenium. In Formula 1, the trimethylenemethane-based ligand (L) is represented by the following Formula 2. Besides, the ligand X is any one of an isocyanide ligand, a pyridine ligand, an amine ligand, an imidazole ligand, a pyridazine ligand, a pyrimidine ligand, and a pyrazine ligand.