The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2026
Filed:
Oct. 22, 2021
Canon Kabushiki Kaisha, Tokyo, JP;
Nilabh K. Roy, Austin, TX (US);
Jeffrey Dean Klein, Austin, TX (US);
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A method for identifying a model for modeling cable stress relaxation dynamics of an imprint head is provided. The method includes performing a non-contact imprint test run for a predetermined number of wafers. Data from a force trace and a position trace of the imprint head during the non-contact imprint test run are collected to compute cable stress relaxation forces. A model having a plurality of different model orders is generated. A set of parameters of the model for each model order is identified. Residual sum of squares for wafer average error for each of the model orders is calculated based on the obtained cable stress relaxation forces. The set of parameters of one of the plurality of model orders may be based on a difference in the residual sum of squares for wafer average error between the one of the plurality of model orders and a next higher model.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile