The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2026
Filed:
Sep. 18, 2024
Rigaku Corporation, Tokyo, JP;
Takumi Ota, Tokyo, JP;
RIGAKU CORPORATION, Tokyo, JP;
Abstract
A correction apparatus reduces time and labor, reduces an artificiality, and improves reproducibility of correction by correcting a shift of a profile with an automatically estimated correction amount. A correction apparatus for correcting a profile of X-ray powder diffraction comprises processing circuitry configured to set a reference profile, set an estimation method for estimating a correction amount related to a sample height, estimate the correction amount based on the estimation method, and correct a subject profile based on the correction amount, wherein the correction amount is a value that maximizes a degree of coincidence between the corrected subject profile and the reference profile.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile