The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2026

Filed:

Jun. 01, 2022
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Roland Rupp, Lauf, DE;

Alexander Breymesser, Villach, AT;

Andre Brockmeier, Villach, AT;

Carsten Von Koblinski, Villach, AT;

Francisco Javier Santos Rodriguez, Villach, AT;

Ronny Kern, Finkenstein, AT;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/30 (2006.01); H01L 21/46 (2006.01); H10P 54/00 (2026.01); H10W 40/22 (2026.01); H10W 74/01 (2026.01); H10W 74/10 (2026.01); H10W 74/43 (2026.01); H10W 99/00 (2026.01); H10W 72/00 (2026.01); H10W 72/29 (2026.01); H10W 72/59 (2026.01); H10W 72/90 (2026.01);
U.S. Cl.
CPC ...
H10P 54/00 (2026.01); H10W 40/22 (2026.01); H10W 74/014 (2026.01); H10W 74/137 (2026.01); H10W 74/43 (2026.01); H10W 99/00 (2026.01); H10W 72/01923 (2026.01); H10W 72/01935 (2026.01); H10W 72/0198 (2026.01); H10W 72/07331 (2026.01); H10W 72/29 (2026.01); H10W 72/59 (2026.01); H10W 72/921 (2026.01); H10W 72/923 (2026.01); H10W 74/129 (2026.01);
Abstract

A method for forming semiconductor devices includes: attaching a glass structure to a wide band-gap semiconductor wafer having a plurality of semiconductor devices; forming at least one pad structure electrically connected to at least one doping region of a semiconductor substrate of the wide band-gap semiconductor wafer, by forming electrically conductive material within at least one opening extending through the glass structure; and reducing a thickness of the wide band-gap semiconductor wafer after attaching the glass structure. Additional methods for forming semiconductor devices are described.


Find Patent Forward Citations

Loading…