The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Apr. 21, 2022
Semiconductor Manufacturing International (Shanghai) Corporation, Shanghai, CN;
Semiconductor Manufacturing International (Beijing) Corporation, Beijing, CN;
Jisong Jin, Shanghai, CN;
Abstract
A semiconductor structure and a method for forming the same are provided. One form of a method includes: forming a source/drain groove in the channel structure on two sides of a gate structure; forming a sacrificial epitaxial layer on a bottom of the source/drain groove; forming, on the sacrificial epitaxial layer, a source/drain doped layer in the source/drain groove; and removing the sacrificial epitaxial layer, to form a gap between a bottom of the source/drain doped layer and the protrusion. After the sacrificial epitaxial layer is formed, the source/drain doped layer located in the source/drain groove may be formed on the sacrificial epitaxial layer using the epitaxy process on the basis of the sacrificial epitaxial layer. Therefore, the epitaxy process for forming the source/drain doped layer is prevented from adverse effects, the epitaxial growth quality of the source/drain doped layer is ensured, and a performance of the semiconductor structure is optimized.