The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Oct. 26, 2022
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Yoshio Susa, Tama, JP;
Koei Aida, Hachioji, JP;
Ryo Miyama, Tokyo, JP;
Yoshiyuki Kikuchi, Tokyo, JP;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H10P 14/60 (2026.01); H10P 50/28 (2026.01); H10P 72/72 (2026.01);
U.S. Cl.
CPC ...
H01J 37/3244 (2013.01); H10P 14/6336 (2026.01); H10P 50/283 (2026.01); H10P 72/72 (2026.01);
Abstract
Methods and apparatuses for etching a perimeter of a substrate are disclosed. Exemplary methods and apparatuses can be used to deposit material and selectively etch material at the perimeter of the substrate within the same reaction chamber.