The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Dec. 19, 2020
Soochow University, Suzhou, CN;
SOOCHOW UNIVERSITY, Suzhou, CN;
Abstract
The invention discloses a design method of a wavenumber linearity dispersion optical system and an imaging spectrometer, including: building an optical system including a grating, a prism and an objective lens that are sequentially arranged, the grating adjoins the prism; defining a linearity evaluation coefficient RMS; assigning a minimum value to the linearity evaluation coefficient RMS through adjustment to the vertex angle of the prism, when the linearity evaluation coefficient RMS is at minimum, the vertex angle of the prism being α; acquiring compensations for distortion and longitudinal chromatic aberration of the objective lens based on the interval between equal-difference wavenumbers on the image plane when the vertex angle of the prism is α; and optimizing the objective lens based on the compensations for distortion and longitudinal chromatic aberration of the objective lens to obtain an optimized optical system. Higher wavenumber linearity can be achieved through objective-lens-aberration compensated wavenumber linearity.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile