The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Dec. 26, 2023
Applied Materials, Inc., Santa Clara, CA (US);
Shifang Li, Pleasanton, CA (US);
Yudong Hao, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A system and method for providing analysis of at least some of a plurality of un-patterned and patterned metrology targets during a fabrication process. A sample is arranged within a chamber of a semiconductor processing tool. The sample has the plurality of un-patterned and patterned metrology targets. A metrology tool integrated with the semiconductor processing tool can provide the analysis of at least some of the plurality of un-patterned and patterned metrology targets. One or more parameters associated with the plurality of patterned metrology targets are determined using optical metrology signals from the plurality of un-patterned metrology targets.