The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Jun. 01, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Nitin Bharadwaj Satyavolu, Kakinada, IN;
Kirankumar Neelasandra Savandaiah, Bangalore, IN;
Hari Prasath Rajendran, Coimbatore, IN;
Srinivasa Rao Yedla, Bangalore, IN;
Lakshmikanth Krishnamurthy Shirahatti, Bangalore, IN;
Thomas Brezoczky, Los Gatos, CA (US);
Keith A. Miller, Mountain View, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for substrate processing and a cluster tool including a transfer chamber assembly and a plurality of processing assemblies. The transfer chamber assembly and processing assemblies may include processing platforms for ALD, CVD, PVD, etch, cleaning, implanting, heating, annealing, and/or polishing processes. Processing chamber volumes are sealed from the transfer chamber volume using a support chuck on which a substrate is disposed thereon. The support chuck is raised to form an isolation seal between the processing chamber volume and the transfer chamber volume using a bellows assembly and a chuck sealing surface.