The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2026

Filed:

Feb. 23, 2024
Applicant:

Nanotronics Imaging, Inc., Cuyahoga Falls, OH (US);

Inventors:

Joanna Lee, Brooklyn, NY (US);

Jacob Keith, Brooklyn, NY (US);

Anuj Doshi, Long Island City, NY (US);

Assignee:

Nanotronics Imaging, Inc., Cuyahoga Falls, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06V 10/00 (2022.01); G06T 7/00 (2017.01); G06V 10/764 (2022.01); G06V 20/70 (2022.01);
U.S. Cl.
CPC ...
G06T 7/0008 (2013.01); G06V 10/764 (2022.01); G06V 20/70 (2022.01); G06T 2207/20081 (2013.01);
Abstract

A computing system generates a training data set for training a machine learning model to detect line defects on a surface of a specimen. The computing system trains the machine learning model to detect line defects based on the training data set. The machine learning model is trained to detect line defects by detecting the individual defects represented by the plurality of annotations extending between the starting point and the end point. The computing system determines that the machine learning model has exceeded a threshold level of accuracy. Based on the determining, the computing system deploys the machine learning model to detect line defects on future specimens.


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