The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Dec. 15, 2023
Mitutoyo Corporation, Kanagawa-ken, JP;
Norman Laman, Kenmore, WA (US);
Nick Hartmann, Kirkland, WA (US);
Mitutoyo Corporation, Kangawa-Ken, JP;
Abstract
A metrology system is provided for use with a movement system that moves an end tool. The metrology system includes a sensor configuration, a light beam source configuration and a processing portion. The light beam source configuration directs a first pattern of light beams and a second pattern of light beams to light beam sensors to indicate a position and orientation of the light beam source configuration. The first pattern of light beams has a lower density of light beams as compared to the second pattern of light beams. Measurement signals from the light beam sensors are processed to determine a position and orientation of the light beam source configuration. The first pattern light beams and the second pattern light beams have at least one different characteristic (e.g., wavelength, polarity, timing, etc.) that enables the first pattern light beams to be distinguished from the second pattern light beams.