The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2026

Filed:

Aug. 23, 2021
Applicant:

Merck Patent Gmbh, Darmstadt, DE;

Inventors:

Masamichi Kurokawa, Kakegawa, JP;

Masahiro Ishii, Kakegawa, JP;

Toshiya Okamura, Kakegawa, JP;

Assignee:

Merck Patent GmbH, Darmstadt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 183/16 (2006.01); B05D 3/10 (2006.01); C08G 77/62 (2006.01); H10P 14/60 (2026.01); H10P 14/692 (2026.01);
U.S. Cl.
CPC ...
C09D 183/16 (2013.01); B05D 3/107 (2013.01); C08G 77/62 (2013.01); H10P 14/6342 (2026.01); H10P 14/6689 (2026.01); H10P 14/69215 (2026.01);
Abstract

To provide a polysilazane and a siliceous film-forming composition which can suppress film thickness variation and voids even in the ozone containing atmosphere. [Means for Solution] A polysilazane comprising N—Si bonds, wherein the ratio (NA/NA) of the number of N atoms having 3 N—Si bonds (NA) to the number of N atoms having 2 N—Si bonds (NA) is 1.8 to 6.0.


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