The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2026

Filed:

Dec. 07, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Dhritiman Subha Kashyap, Bangalore, IN;

Sanjeev Baluja, Campbell, CA (US);

Chaowei Wang, San Diego, CA (US);

Amar Nath Nishad, Bangalore, IN;

Robert B. Moore, Bigfork, MT (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32871 (2013.01); H01J 37/32834 (2013.01); H01J 2237/334 (2013.01);
Abstract

Gas distribution apparatus comprising a backing plate and faceplate, and methods of use are described. The backing plate has a peripheral channel with a plurality of inwardly angled inlet channels extending from the peripheral channel to the front surface of the backing plate. The plurality of inwardly angled inlet channels are located in an inlet semicircle of the backing plate and spaced to form an inlet zone comprising a minor arc of a semicircle less than 160°. An outlet opening in an outlet semicircle in the range of 30° to 90° is centered opposite the center of the minor arc of the inlet semicircle.


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