The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2026

Filed:

Nov. 11, 2022
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Ralf Winter, Schwaebisch Gmuend, DE;

Vitaly Shklover, Heidenheim, DE;

Assignee:

CARL ZEISS SMT GMBH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01); G02B 5/08 (2006.01); G02B 5/10 (2006.01);
U.S. Cl.
CPC ...
G02B 5/1814 (2013.01); G02B 5/0891 (2013.01); G02B 5/10 (2013.01); G02B 5/1857 (2013.01); G02B 5/1876 (2013.01);
Abstract

An optical element () has an optical surface () with a diffraction structure (). The optical surface () is curved such that a distance-to-diameter ratio between a distance A between a deepest point (T) and a highest point (H) and a largest diameter D is greater than 1/10. When producing the optical element (), firstly a raw optical element having a raw optical surface to be provided with the diffraction structure () is provided. The raw optical surface is then coated with a photoresist with the aid of an isotropic deposition method and the photoresist is exposed and then developed. This results in a production method for an optical element with an optical surface having a diffraction structure, which method satisfies stringent requirements made of a structure accuracy when producing the diffraction structure.


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