The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2026
Filed:
Dec. 07, 2022
Fujifilm Corporation, Tokyo, JP;
Tsutomu Yoshimura, Shizuoka, JP;
Masafumi Kojima, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition has an excellent resolution and is capable of forming a pattern having suppressed defects. A resist film, a pattern forming method, and a method for manufacturing an electronic device employing the actinic ray- or radiation-sensitive resin composition are provided. The actinic ray- or radiation-sensitive resin composition includes a resin whose polarity increases through decomposition by an action of an acid, and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the resin whose polarity increases through decomposition by an action of an acid includes one or more selected from repeating units represented by Formulae (1) to (5), and the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more of a compound (I) or a compound (II).