The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2026

Filed:

Mar. 03, 2023
Applicant:

SK Hynix Inc., Gyeonggi-do, KR;

Inventor:

Young Gwang Yoon, Gyeonggi-do, KR;

Assignee:

SK hynix Inc., Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 30/69 (2025.01); H10D 30/01 (2025.01); H10D 64/68 (2025.01); H10D 84/01 (2025.01); H10D 84/03 (2025.01); H10D 84/85 (2025.01);
U.S. Cl.
CPC ...
H10D 84/85 (2025.01); H10D 30/0415 (2025.01); H10D 30/701 (2025.01); H10D 64/689 (2025.01); H10D 84/0181 (2025.01); H10D 84/038 (2025.01);
Abstract

A semiconductor device includes a first gate stack and a second gate stack disposed on a substrate. The first gate stack includes a first lower gate insulating layer. The second gate stack includes a second lower gate insulating layer. The first lower gate insulating layer includes silicon oxide with a first dipole material. The second lower gate insulating layer includes silicon oxide with a second dipole material. The first dipole material and the second dipole material are different from each other.


Find Patent Forward Citations

Yoon, Young. (2026). Semiconductor device and a method of manufacturing the semiconductor device (U.S. Patent No. 12641872). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12641872

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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