The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2026

Filed:

Nov. 14, 2022
Applicant:

Advanced Micro Devices, Inc., Santa Clara, CA (US);

Inventor:

Richard T. Schultz, Ft. Collins, CO (US);

Assignee:

Advanced Micro Devices, Inc., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10D 84/01 (2026.01); H10D 30/67 (2025.01); H10D 62/10 (2025.01); H10D 84/03 (2025.01); H10D 84/83 (2025.01); H10D 88/00 (2025.01); H10W 20/20 (2026.01); H10W 20/41 (2026.01);
U.S. Cl.
CPC ...
H10D 84/0128 (2025.01); H10D 30/6735 (2025.01); H10D 30/6755 (2025.01); H10D 30/6757 (2025.01); H10D 62/121 (2025.01); H10D 84/0149 (2025.01); H10D 84/038 (2025.01); H10D 84/834 (2025.01); H10D 88/00 (2025.01); H10W 20/20 (2026.01); H10W 20/427 (2026.01);
Abstract

An apparatus and method for efficiently routing power signals across a semiconductor die. In various implementations, an integrated circuit uses Cross field effect transistors (FETs) with a first device, such as n-type device, having a first channel oriented in a first direction and connected to a ground reference voltage level provided by a backside metal layer. The Cross FETs also use a second device, such as the p-type device, having a second channel oriented in a second direction orthogonal to the first direction and connected to a power supply reference voltage level provided by a frontside metal layer. A micro through silicon via (TSV) traverses the silicon substrate layer in order to be placed between the backside metal layer and the source region of an n-type device. The power connections reduce on-die area, reduces semiconductor fabrication complexity, which improves wafer yield, and reduces voltage droop, which increases performance.


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