The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2026
Filed:
Jul. 24, 2024
Samsung Electronics Co., Ltd., Suwon-si, KR;
Seunghun Kim, Suwon-si, KR;
Donghoon Park, Suwon-si, KR;
Minjung Kim, Suwon-si, KR;
Geongu Jang, Suwon-si, KR;
Taemin Kim, Suwon-si, KR;
Jiho Uh, Suwon-si, KR;
Jinseok Lee, Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
Disclosed are mass flow controllers of a substrate processing apparatus, flow control methods the substrate processing apparatus, and substrate processing methods. The flow control method comprises receiving a mode selection signal, controlling a flow control valve under a first mode to allow a flow rate of fluid to change by a first flow rate, and controlling the flow control valve under a second mode to allow the flow rate of fluid to change by a second flow rate. The step of controlling the flow control valve under the first mode includes applying a first voltage to a first piezoelectric stack assembly of a piezoelectric actuator connected to the flow control valve. The step of controlling the flow control valve under the second mode includes applying a second voltage to a second piezoelectric stack assembly disposed on the first piezoelectric stack assembly. The second voltage is different from the first voltage.