The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2026

Filed:

May. 16, 2022
Applicant:

Nissan Chemical Corporation, Tokyo, JP;

Inventors:

Masahisa Endo, Toyama, JP;

Hayato Hattori, Toyama, JP;

Hikaru Tokunaga, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); C08G 65/38 (2006.01); G03F 7/00 (2006.01); G03F 7/40 (2006.01); H10P 50/00 (2026.01);
U.S. Cl.
CPC ...
G03F 7/094 (2013.01); C08G 65/38 (2013.01); G03F 7/40 (2013.01); G03F 7/70008 (2013.01); H10P 50/73 (2026.01);
Abstract

A novel composition for forming a resist underlayer film contains: a polymer (X) which includes structural units the same as or different from each other and having a hydroxymethyl group and a ROCH— group (R being a monovalent organic group, or a mixture of these), and a linking group linking the aforementioned structural units; and a solvent.


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