The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2026

Filed:

Jun. 14, 2023
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Chao Zhang, Helsinki, FI;

Mikko Ritala, Espoo, FI;

Eva Tois, Espoo, FI;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/18 (2006.01); H10P 14/40 (2026.01);
U.S. Cl.
CPC ...
C23C 16/45553 (2013.01); C23C 16/18 (2013.01); H10P 14/418 (2026.01);
Abstract

The current disclosure relates to methods and apparatuses for the manufacture of semiconductor devices. In the disclosure, a material comprising noble metal is selectively deposited on a substrate by a cyclic deposition process. The deposition method comprises providing a substrate in a reaction chamber, wherein the substrate comprises a first surface comprising a first material, and a second surface comprising a second material. A noble metal precursor comprising a noble metal β-diketonate compound is provided in the reaction chamber in vapor phase and a reactant is provided in the reaction chamber in vapor phase to deposit a material comprising noble metal on the first surface relative to the second surface.


Find Patent Forward Citations

Loading…