The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Jun. 23, 2023
Applicant:

Globalfoundries U.s. Inc., Malta, NY (US);

Inventors:

Anupam Dutta, Kolkata, IN;

Satyasuresh Vvss Choppalli, Bangalore, IN;

Rui Tze Toh, Singapore, SG;

Mei Hui June Goh, Singapore, SG;

Assignee:

GlobalFoundries U.S. Inc., Malta, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10W 90/00 (2026.01); H10W 80/00 (2026.01);
U.S. Cl.
CPC ...
H10W 90/00 (2026.01); H10W 80/312 (2026.01); H10W 80/327 (2026.01); H10W 90/792 (2026.01);
Abstract

Disclosed structures and methods include a top chip flipped relative to a bottom chip and bonded thereto. On the top chip, dielectric material layers separate a transistor from the bottom chip. The transistor includes source and drain regions, a body region on a channel region between the source and drain regions, and a gate structure adjacent to and between the channel region and the dielectric material layers. An insulator layer is on the transistor opposite the dielectric material layers and includes an opening extending to the body region. Optionally, a semiconductor layer is at the bottom of the opening. A contact extends into the opening to the body region (or to the semiconductor layer thereon, if applicable).


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