The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Oct. 11, 2023
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Mark Saly, Santa Clara, CA (US);
David Thompson, San Jose, CA (US);
Thomas Knisley, Livonia, MI (US);
Bhaskar Jyoti Bhuyan, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10P 14/692 (2026.01); H10P 14/60 (2026.01);
U.S. Cl.
CPC ...
H10P 14/6927 (2026.01); H10P 14/6336 (2026.01); H10P 14/6339 (2026.01); H10P 14/6682 (2026.01); H10P 14/6686 (2026.01); H10P 14/6922 (2026.01);
Abstract
Methods of forming SiCON films comprising sequential exposure to a silicon precursor and a mixture of alkanolamine and amine reactants and an optional plasma are described. Methods of forming a silicon-containing film comprising sequential exposure to a silicon precursor and an epoxide with an optional plasma exposure are also described.