The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Aug. 24, 2022
Tokyo Electron Limited, Tokyo, JP;
Ryo Sasaki, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus includes: a stage including a substrate placing portion and a peripheral portion surrounding the substrate placing portion; a focus ring placed on the peripheral portion of the stage; a cover ring surrounding an outer periphery of the stage; a conductive ring placed on the cover ring; a radio-frequency power supply coupled to the stage; first and second power supply lines electrically connected to the focus ring and the conductive ring, respectively; and a DC power supply electrically connected to the focus ring and the conductive ring via the first and second power supply lines, respectively. A first surface on an outer periphery of the focus ring and a second surface on an inner periphery of the conductive ring are separated from each other to face each other. The cover ring includes a separating portion that separates the focus ring and the conductive ring.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile