The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Dec. 23, 2021
Lam Research Corporation, Fremont, CA (US);
Alexei M. Marakhtanov, Albany, CA (US);
Felix Leib Kozakevich, Sunnyvale, CA (US);
Bing Ji, Pleasanton, CA (US);
John P. Holland, San Jose, CA (US);
Ranadeep Bhowmick, San Jose, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for achieving a first uniformity level in a processing rate across a surface of a substrate is described. The method includes receiving the first uniformity level to be achieved across the surface of the substrate and identifying a first plurality of duty cycles associated with a first plurality of states based on the first uniformity level. The first plurality of states are of a variable of a first radio frequency (RF) signal. The method further includes controlling an RF generator to generate the first RF signal having the first plurality of duty cycles.