The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Jun. 19, 2024
Tokyo Electron Limited, Tokyo, JP;
Morihito Inagaki, Yamanashi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate processing method includes providing a substrate processing apparatus including a vacuum container, a rotary table that includes a placement surface on which a plurality of substrates is disposed, and rotates the plurality of substrates, a plasma generator that includes an antenna and generates a plasma in the vacuum container, and a first driving unit that moves the antenna; storing ignition condition information that associate a process condition and a position of the antenna with each other, in a storage; determining the position of the antenna corresponding to the process condition of the ignition condition information that matches a process condition set in a recipe by referring to the storage; and moving the antenna to the determined position of the antenna using the first driving unit, thereby processing the plurality of the substrates.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile