The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Oct. 30, 2023
Applicant:

Jeol Ltd., Tokyo, JP;

Inventors:

Shigeyuki Morishita, Tokyo, JP;

Yuji Kohno, Tokyo, JP;

Assignee:

JEOL Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/21 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/21 (2013.01); H01J 37/28 (2013.01); H01J 2237/1516 (2013.01); H01J 2237/1534 (2013.01);
Abstract

A method of adjusting a charged particle optical system in a charged particle beam apparatus provided with the charged particle optical system including an aberration corrector in which multipole elements disposed in three or more stages and transfer optical systems are alternately disposed. The method includes adjusting aberration using at least two of the multipole elements without using at least one of the multipole elements, and adjusting parameters of the charged particle optical system other than aberration using at least one of the transfer optical systems that is not disposed between the at least two of the multipole elements used.


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