The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Sep. 29, 2022
Applicant:
Synopsys, Inc., Mountain View, CA (US);
Inventor:
Peng Liu, Cupertino, CA (US);
Assignee:
Synopsys, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/36 (2012.01); G03F 1/70 (2012.01); G03F 7/00 (2006.01); G06F 30/27 (2020.01); G06F 30/30 (2020.01); G06F 30/398 (2020.01); G06F 119/18 (2020.01);
U.S. Cl.
CPC ...
G03F 1/70 (2013.01); G03F 1/36 (2013.01); G03F 7/70283 (2013.01); G03F 7/70441 (2013.01); G03F 7/705 (2013.01); G03F 7/706841 (2023.05); G06F 30/27 (2020.01); G06F 30/30 (2020.01); G06F 30/398 (2020.01); G06F 2119/18 (2020.01);
Abstract
Feature images representing a layout geometry of a lithographic mask are received. Mask function (MF) contributions from individual feature images are calculated by convolving the feature image with a corresponding three-dimensional mask (M3D) filter. The M3D filters represent an electromagnetic scattering effect of that feature image. At least one M3D filter also accounts for effects arising from a fabrication process for the lithographic mask.
Liu, Peng. (2026). Mask fabrication effects in three-dimensional mask simulations using feature images (U.S. Patent No. 12631956). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12631956
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile