The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Aug. 24, 2021
Applicant:
Malvern Panalytical B.v., Almelo, NL;
Inventors:
Roelof De Vries, Almelo, NL;
Vladimir Jovanovic, Almelo, NL;
Assignee:
Malvern Panalytical B.V., Almelo, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/20008 (2018.01); A61B 6/42 (2024.01);
U.S. Cl.
CPC ...
G01N 23/20008 (2013.01); A61B 6/4241 (2013.01);
Abstract
An X-ray diffraction apparatus and method of processing signals from an X-ray diffraction apparatus are disclosed. By analysing a time delay between first and second pulses, generated by respective first and second detector cells, and by analysing an energy of each of the first pulse and the second pulse, charge sharing events and coincident photon events can be identified.
De Vries, Roelof. (2026). Identifying charge sharing in x-ray diffraction (U.S. Patent No. 12631576). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12631576
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile