The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Jul. 15, 2022
Applicant:
Toppan Inc., Tokyo, JP;
Inventors:
Reiko Iwata, Taito-ku, JP;
Yuri Nagai, Taito-ku, JP;
Hanae Tagami, Taito-ku, JP;
Shigeki Furukawa, Taito-ku, JP;
Assignee:
TOPPAN Inc., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C08F 20/18 (2006.01); C08F 220/18 (2006.01); C08F 220/30 (2006.01); C08F 220/32 (2006.01); C08K 5/14 (2006.01); C08K 5/17 (2006.01); C08K 5/3417 (2006.01); C08K 5/47 (2006.01); C08K 5/50 (2006.01); G02B 1/04 (2006.01); G02B 5/20 (2006.01); G02B 5/22 (2006.01); H01L 27/146 (2006.01); H10F 39/00 (2025.01); H10F 39/12 (2025.01); C08K 5/00 (2006.01); H10F 39/18 (2025.01);
U.S. Cl.
CPC ...
C08F 20/18 (2013.01); C08F 220/18 (2013.01); C08F 220/1806 (2020.02); C08F 220/1811 (2020.02); C08F 220/30 (2013.01); C08F 220/301 (2020.02); C08F 220/325 (2020.02); C08K 5/14 (2013.01); C08K 5/17 (2013.01); C08K 5/3417 (2013.01); C08K 5/47 (2013.01); C08K 5/50 (2013.01); G02B 1/04 (2013.01); G02B 5/208 (2013.01); G02B 5/22 (2013.01); G02B 5/223 (2013.01); H10F 39/024 (2025.01); H10F 39/12 (2025.01); H10F 39/805 (2025.01); C08K 5/0041 (2013.01); H10F 39/182 (2025.01); H10F 39/8053 (2025.01);
Abstract
An infrared cut-off filter, including a cyanine dye and a copolymer. The cyanine dye includes tris(pentafluoroethyl) trifluorophosphate and a cation having a polymethine and a nitrogen-containing heterocycle at each end of the polymethine. The copolymer includes a first repeating unit from a first monomer and a second repeating unit from a second monomer different from the first monomer. The first monomer includes a phenolic hydroxyl group.