The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Nov. 30, 2022
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Yun Sang Kim, Seongnam-si, KR;
Yoon Seok Choi, Suwon-si, KR;
Young Dae Chung, Incheon, KR;
Soon-Cheon Cho, Pyeongtaek-si, KR;
Se Hoon Oh, Cheonan-si, KR;
Assignee:
Semes Co., LTD., Cheonan-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 5/02 (2006.01); B05C 13/02 (2006.01); H05B 6/78 (2006.01); H05B 6/80 (2006.01);
U.S. Cl.
CPC ...
B05C 5/02 (2013.01); B05C 13/02 (2013.01); H05B 6/78 (2013.01); H05B 6/80 (2013.01); H05B 2206/04 (2013.01);
Abstract
Provided are a substrate treating apparatus and a substrate treating method. The substrate treating apparatus includes: a chamber for providing a processing space; a substrate support unit provided in the processing space to support a substrate and rotate the substrate; a liquid supply unit including a chemical liquid discharge nozzle that discharges a chemical liquid to the substrate supported by the substrate support unit; and a microwave applying member for emitting microwaves to the substrate.