The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

Jun. 29, 2023
Applicant:

Enkris Semiconductor, Inc., Suzhou, CN;

Inventors:

Kai Liu, Suzhou, CN;

Kai Cheng, Suzhou, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 72/70 (2026.01);
U.S. Cl.
CPC ...
H10P 72/74 (2026.01); H10P 72/7422 (2026.01); H10P 72/7424 (2026.01);
Abstract

Disclosed is a semiconductor structure. The semiconductor structure includes a support structure, and a first dielectric layer and a growth substrate sequentially formed on the support structure, where a gravity center of the support structure and a gravity center of the growth substrate are disposed in a staggered manner, so that the direct contact between the growth substrate and the graphite disk can be avoided, a centrifugal force on the growth substrate exerted by the graphite disk to the support structure can be transferred, thereby further ensuring a quality of the growth substrate, and significantly reducing a probability of cracking to ensure a crystal quality of a subsequent epitaxial layer. The support structure is formed at the bottom of the growth substrate, so that a mechanical strength of the semiconductor structure can be effectively improved, a stability can be enhanced, and a deformation of the semiconductor structure can be suppressed.


Find Patent Forward Citations

Loading…